The workshop brings together experts from various fields of lithography simulation. It will provide an excellent opportunity to exchange ideas and discuss results and developtments in different areas.
Computational EUV lithography: 3D mask, high NA and stochastic effects, resolution enhancement techniques, novel mask & resist metarials and phenomena
Computational metrology and imaging for lithography: Deep learning and related techniques, mask characterization, hybrid optical models, SEM modeling, big data and novel methods for process characterization
Alternative (optical) lithography methods: Laser direct write, interference lithography, mask aligners, 3D lithography and gray tone techniques
Will be published at the beginning of July
with interest in lithography
About Course Provider
The Fraunhofer Institute for Integrated Systems and Device Technology IISB has decades of experience in applied research in the fields of semiconductors and intelligent power electronics.