Project Description

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18th Fraunhofer IISB
Lithography Simulation Workshop

The workshop brings together experts from various fields of lithography simulation. It will provide an excellent opportunity to exchange ideas and discuss results and developtments in different areas.

Content

  • Computational EUV lithography: 3D mask, high NA and stochastic effects, resolution enhancement techniques, novel mask & resist metarials and phenomena
  • Computational metrology and imaging for lithography: Deep learning and related techniques, mask characterization, hybrid optical models, SEM modeling, big data and novel methods for process characterization
  • Alternative (optical) lithography methods: Laser direct write, interference lithography, mask aligners, 3D lithography and gray tone techniques

Agenda

  • Will be published at the beginning of July

Target Audience

  • Researchers
  • Engineers
  • Students
    with interest in lithography

About Course Provider

The Fraunhofer Institute for Integrated Systems and Device Technology IISB has decades of experience in applied research in the fields of semiconductors and intelligent power electronics.

The workshop is sponsored by SAOT https://www.saot.fau.de

Course Provider

Fraunhofer Institute for Integrated Systems and Device Technology IISB

Adress

Schottkystrasse 10, 91058 Erlangen

Phone

+49 9131 761 258

Event Details

Location

Price

Regular Participants:
950.00 EUR plus 19% VAT

Students:
450.00 EUR plus 19% VAT

Date

September 10th – 12th, 2020

Language

English

Speaker

Will be published at the beginning of July

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Non-binding Request

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